OmniMatch Plus™

OmniMatch Plus™ is an advanced lithography tool modeling software package used to assess the quality of overlay matching.

  • OmniMatch Plus TM Software Suite – Key Features 
    • On product overlay monitoring
      • Model based “Prediction Interval” lot/wafer dispositioning
      • Integrates with fab SPC systems 
    • Analyze overlay error sources and identify non-OEM interventions
    • Analyze overlay matching between steppers and scanners.
      • Diagnose and intervene for optimum matching
    • Analyze field-to-field stitching
    • Monitor individual tool overlay performance over time

OmniMatch Plus™ can be used to effectively initiate an overlay monitoring program in conjunction with Benchmark’s Universal Matching Reticle, or can be used to assess on- product overlay targets as part of routine production statistical process control. The components of overlay are extracted from the data set using multiple regression analysis, and the errors can be divided into alignment, lens, distortion and step/scans. The results for each component are reported in the terms that the lithography tool OEM’s use for easy comparison.

OmniMatch Plus™ contains models for all widely used lithography tool including those manufactured by ASML, Nikon, Canon, and others. The software uses ASCII input extracted from the fab overlay tool. Benchmark Technologies has developed parsers for all major models of overlay metrology tool and continues to expand this capability.

For a sampling of OmniMatch Plus™ screen shots (PDF) click here.

For more information about OmniMatch Plus™ please contact us.