Benchmark Technologies designs and fabricates gray scale masks to address the needs of micro-lithographers desiring to shape resist using a single exposure with a custom attenuating mask. Using high resolution mask shop e-beam or laser writers with associated processes, proprietary pattern rendering software and knowledge of the customer’s resist and etch processes, Benchmark’s gray scale masks are a truly enabling technology.

Our grayscale approach can be applied in applications where a slope in the resist pattern is desired or for more complex 3-D shapes, such as micro or Fresnel lenses. The method is most successful using reduction lithography with low contrast resists where shaping over distances of many microns is desired.

A similar pixilation approach can also be applied to light filtering applications for varying density patterns on glass for use in optical systems.

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