Resolution Test Reticle

Benchmark’ Resolution Test Reticles are unique submicroon resolution and process control test patterns designed for use with virtually all lithography systems.

Test Patterns include the following:

• Long and short lines, to permit measurement of linearity and adhesion
• Isolated needles, to determine optimum focus and exposure
• Focus star, to evaluate astigmatism and coma, as well as best focus, resolution limit and exposure bias
• L-bars for SEM evaluation, to measure resolution and process performance
• Step coverage matrix consisting of standard and proximity L-bars, to provide the ability to evaluate proximity effects
• Contact array/mini resolution pattern, to provide simple, quick resolution analysis of isolated contacts
• Contact astigmatism pattern, used as alternative method of measuring